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Microstructure, shear strength, and nanoindentation property of electroplated Sn-Bi micro-bumps

机译:电镀Sn-Bi微凸块的组织,剪切强度和纳米压痕性能

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摘要

In order to investigate the microstructure and mechanical properties of small sized Sn-Bi bump, the eutectic Sn-Bi bumps with a diameter of 25 μm and a height of less than 20 μm after reflow were fabricated by electroplating and reflow. The reflow temperature of the Sn-Bi bumps was 170℃, and the reflow times were varied from 5 to 20 min. The experimental results showed that a eutectic Sn-Bi composition was obtained by plating at a current density of 30 tnA/cm~2 for 15 min. The average height and diameter of the bumps reflowed for 5 min were 16.1 ± 0.7 μm and 25.2 ± 0.7 μm, respectively. The micro-structure of the reflowed bumps consisted of Sn- and Bi-rich phases. The thickness of the IMC of Cu_6Sn_5 increased from 1.17 to 2.25 μm with increasing reflow time from 5 to 20 min. The shear strength of the reflowed Sn-Bi bump increased with increasing reflow time, and reached approximately 11 gf at 15 and 20 min. The elastic modulus and hardness of eutectic Sn-Bi bump by nanoindentation were 53.5 and 0.43 GPa. Those of Cu_6Sn_5 were found to be 121.1 and 6.67 GPa.
机译:为了研究小尺寸的Sn-Bi凸块的微观结构和力学性能,通过电镀和回流制备了回流后直径为25μm且高度小于20μm的共晶Sn-Bi凸块。 Sn-Bi凸块的回流温度为170℃,回流时间为5至20分钟。实验结果表明,通过在30 tnA / cm〜2的电流密度下电镀15 min,可获得共晶的Sn-Bi成分。回流5分钟的凸块的平均高度和直径分别为16.1±0.7μm和25.2±0.7μm。回流焊凸点的微观结构由富Sn和Bi的相组成。 Cu_6Sn_5的IMC厚度从1.17微米增加到2.25微米,回流时间从5分钟增加到20分钟。回流的Sn-Bi凸块的剪切强度随回流时间的增加而增加,并在15和20分钟时达到约11 gf。通过纳米压痕,共晶Sn-Bi凸块的弹性模量和硬度为53.5和0.43 GPa。发现Cu_6Sn_5的那些为121.1和6.67GPa。

著录项

  • 来源
    《Microelectronics & Reliability》 |2014年第1期|265-271|共7页
  • 作者单位

    Department of Materials Science and Engineering, University of Seoul, Seoul 130-743, Republic of Korea;

    Department of Materials Science and Engineering, University of Seoul, Seoul 130-743, Republic of Korea;

    Department of Materials Science and Engineering, University of Seoul, Seoul 130-743, Republic of Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
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