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首页> 外文期刊>Microelectronics & Reliability >Transient dual interface measurement of junction-to-case thermal resistance in AlGaN/GaN HEMT utilizing an improved infrared microscope
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Transient dual interface measurement of junction-to-case thermal resistance in AlGaN/GaN HEMT utilizing an improved infrared microscope

机译:利用改进的红外显微镜对AlGaN / GaN HEMT中结壳热阻进行瞬态双界面测量

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The junction-to-case thermal resistance (R-theta JC) of a GaN/AlGaN HEMT is measured by Transient Dual Interface Method (TDIM). Different from other works about TDIM, an improved transient infrared microscope is used to measure the cooling curves, other than the traditional electrical method. Z(th) curves are used to determine the R-theta JC following the procedure of JESD51-14. The results demonstrate that the R-theta JC at 40 W power dissipation are about 0.791 K/W. In order to validate the method, measurements following MIL Std 833 have been done, and the results are consistent with the existing papers. (C) 2016 Elsevier Ltd. All rights reserved.
机译:GaN / AlGaN HEMT的结壳热阻(R-θJC)通过瞬态双界面法(TDIM)测量。与其他有关TDIM的著作不同,除了传统的电子方法外,改进的瞬态红外显微镜还用于测量冷却曲线。 Z(th)曲线用于按照JESD51-14的程序确定R-θJC。结果表明,在40 W功耗下的R-theta JC约为0.791 K / W。为了验证该方法,已按照MIL Std 833进行了测量,结果与现有论文一致。 (C)2016 Elsevier Ltd.保留所有权利。

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