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机译:利用改进的红外显微镜对AlGaN / GaN HEMT中结壳热阻进行瞬态双界面测量
Hebei Semicond Res Inst, Metrol Ctr, Shijiazhuang 050051, Peoples R China;
Hebei Semicond Res Inst, Metrol Ctr, Shijiazhuang 050051, Peoples R China;
Beijing Univ Technol, Lab Semicond Device Reliabil Phys, Beijing 100124, Peoples R China;
Hebei Semicond Res Inst, Metrol Ctr, Shijiazhuang 050051, Peoples R China;
Transient dual interface measurement; Junction-to-case thermal resistance; GaN/AIGaN HEMT; Infrared microscopy;
机译:温度对瞬态双界面方法的准确性影响结合与壳体热阻测量
机译:AlGaN / GaN HEMT的热建模和测量,包括热边界电阻
机译:宽带瞬态测量宽带瞬态测量100纳米ALN / GAN / Algan-On-Si-obt中电荷捕获动力学的实验表征
机译:瞬态双接口测量—一种新的JEDEC标准,用于测量结到外壳的热阻
机译:GaN-SiC界面处具有GaN微坑的AlGaN / GaN HEMT中的散热分析
机译:用于脉冲操作的AlGaN / GaN HEMT热设计优化的瞬态仿真
机译:栅极漏电流对alGaN / GaN HEmT的影响由低频噪声和脉冲电测量证明,栅极漏电流对alGaN / GaN HEmT的影响由脉冲I-V和低频噪声测量证明
机译:si,GaN和alGaN / GaN高电子迁移率晶体管(HEmT)晶片的非接触迁移率,载流子密度和薄层电阻测量。