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Role of two-dimensional electron gas (2DEG) in AlGaN/GaN high electron mobility transistor (HEMT) ON-state degradation

机译:二维电子气(2DEG)在AlGaN / GaN高电子迁移率晶体管(HEMT)导通状态退化中的作用

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摘要

We have investigated the influence of the two-dimensional electron gas (2DEG) in AlGaN/GaN high electron mobility transistors (HEMTs) on their reliability under ON-state conditions. Devices stressed in the ON-state showed a faster decrease in the maximum drain current (I-Dmax) compared to identical devices stressed in the OFF-state with a comparable electric field and temperature. Scanning electron microscope (SEM) images of ON-state stressed devices showed pit formation at locations away from the gate-edge in the drain-gate access region. Cross-sectional transmission electron microscope (TEM) images also showed dark features at the AlGaN/SiN interface away from the gate edge. Electron energy loss spectroscopy (EELS) analysis of the dark features indicated the presence of gallium, aluminum and oxygen. These dark features correlate with pits observed in the SEM micrographs. It is proposed that in addition to causing joule heating, energetic electrons in the 2D electron gas contribute to device degradation by promoting electrochemical oxidation of the AlGaN. (C) 2016 Elsevier Ltd. All rights reserved.
机译:我们研究了AlGaN / GaN高电子迁移率晶体管(HEMT)中的二维电子气(2DEG)对它们在导通状态下的可靠性的影响。与处于关断状态且具有可比的电场和温度的相同器件相比,处于导通状态的器件显示出最大漏极电流(I-Dmax)的下降更快。处于开启状态的器件的扫描电子显微镜(SEM)图像显示在漏极-栅极访问区中远离栅极边缘的位置形成了凹坑。横截面透射电子显微镜(TEM)图像还显示出AlGaN / SiN界面上远离栅极边缘的深色特征。暗特征的电子能量损失谱(EELS)分析表明存在镓,铝和氧。这些深色特征与在SEM显微图中观察到的凹坑相关。提出除了引起焦耳加热之外,二维电子气中的高能电子还通过促进AlGaN的电化学氧化而导致器件劣化。 (C)2016 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Microelectronics & Reliability》 |2016年第9期|589-593|共5页
  • 作者单位

    Singapore MIT Alliance Res & Technol, Low Energy Elect Syst, Singapore 138602, Singapore|Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore;

    Singapore MIT Alliance Res & Technol, Low Energy Elect Syst, Singapore 138602, Singapore;

    Singapore MIT Alliance Res & Technol, Low Energy Elect Syst, Singapore 138602, Singapore;

    Nanyang Technol Univ, Temasek Labs, Singapore 637553, Singapore;

    Singapore MIT Alliance Res & Technol, Low Energy Elect Syst, Singapore 138602, Singapore|Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore;

    Nanyang Technol Univ, Temasek Labs, Singapore 637553, Singapore;

    Singapore MIT Alliance Res & Technol, Low Energy Elect Syst, Singapore 138602, Singapore|Nanyang Technol Univ, Sch Mat Sci & Engn, Singapore 639798, Singapore;

    Singapore MIT Alliance Res & Technol, Low Energy Elect Syst, Singapore 138602, Singapore|MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    AlGaN/GaN; HEMT; ON-state; Reliability; III-V semiconductor; Wide band-gap semiconductor;

    机译:AlGaN / GaN;HEMT;导通状态;可靠性;III-V族半导体;宽带隙半导体;

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