首页> 外文期刊>Microelectronics & Reliability >Dielectric charging phenomena in diamond films used in RF MEMS capacitive switches: The effect of film thickness
【24h】

Dielectric charging phenomena in diamond films used in RF MEMS capacitive switches: The effect of film thickness

机译:RF MEMS电容开关中使用的金刚石薄膜中的介电充电现象:薄膜厚度的影响

获取原文
获取原文并翻译 | 示例
       

摘要

The present paper aims to provide a better insight to the dielectric charging phenomena of nano-crystalline diamond (NCD) films that are used in RF MEMS capacitive switches. The electrical properties of NCD films of various thicknesses are investigated with the aid of metal-insulator-metal (MIM) capacitors. The dominant conduction mechanisms have been identified by obtaining current-voltage characteristics in the temperature range from 300 K to 400 K and dielectric charging phenomena have been investigated by using thermally stimulated depolarization currents (TSDC) technique. The experimental results indicate a thermally activated conductivity for low electric field intensities while Hill-type conduction takes place for field intensities >130 kV/cm. The conductivity as well as the defect density seems to increase with film thickness. Enhanced dielectric charging phenomena have been observed on thicker films and the injected charges are found to be trapped through the material's volume. These results indicate that thinner NCD films seem to be more promising for RF MEMS capacitive switches. (C) 2016 Elsevier Ltd. All rights reserved.
机译:本文旨在为射频MEMS电容开关中使用的纳米晶体金刚石(NCD)薄膜的介电充电现象提供更好的见解。借助金属-绝缘体-金属(MIM)电容器研究了各种厚度的NCD膜的电性能。通过在300 K至400 K的温度范围内获得电流-电压特性,已经确定了主要的传导机制,并且已经通过使用热激发去极化电流(TSDC)技术研究了介电充电现象。实验结果表明,低电场强度的热激活电导率,而场强> 130 kV / cm时发生希尔型传导。导电率以及缺陷密度似乎随着膜厚度的增加而增加。在较厚的薄膜上观察到增强的介电充电现象,并且发现注入的电荷被捕获在材料的整个体积中。这些结果表明,更薄的NCD膜似乎更适合RF MEMS电容开关。 (C)2016 Elsevier Ltd.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号