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Copper induced synthesis of graphene using amorphous carbon

机译:铜诱导非晶态碳合成石墨烯

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Copper is approaching its reliability limits with respect to electromigration due to very high current density as a result of continuous technology scaling. Graphene on the other hand has excellent electrical and thermal properties which can prove to be a vital candidate for improving the reliability performance of copper interconnections in ULSI. Possibility of crystallization of amorphous carbon into graphene catalyzed by copper thin film is demonstrated in this work, as evidenced by the Raman, XPS and SIMS analysis, and the number of graphene layer synthesized can be modified with the method developed. As the synthesized graphene layers are on top of the copper film whilst the amorphous carbon source is below the copper film, no contamination of the graphene layer is presence with the method developed, improving the quality and uniformity of the grown graphene layers. (C) 2016 Elsevier Ltd. All rights reserved.
机译:由于技术不断发展,电流密度非常高,因此铜正接近其有关电迁移的可靠性极限。另一方面,石墨烯具有出色的电学和热学性质,可以证明是石墨烯对于提高ULSI中铜互连的可靠性能至关重要。通过拉曼,XPS和SIMS分析证明,通过铜薄膜催化非晶碳结晶成石墨烯的可能性,并且可以通过开发的方法来修改合成的石墨烯层的数量。由于合成的石墨烯层位于铜膜上方,而无定形碳源位于铜膜下方,因此所开发的方法不会对石墨烯层造成污染,从而改善了生长的石墨烯层的质量和均匀性。 (C)2016 Elsevier Ltd.保留所有权利。

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