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A subgap density of states modeling for the transient characteristics in oxide-based thin-film transistors

机译:用于基于氧化物的薄膜晶体管瞬态特性的状态子间隙密度建模

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The modeling of the transient subgap density of states (DOS) for the investigation of trap densities in the oxide based thin-film transistors is proposed. The study is based on both transient measurements and physical modeling. In history, the subgap DOS modeling of trap densities have been studied according to the static-state current-voltage characteristics or the capacitance-voltage curves. However, the subgap DOS modeling for the transient curves is seldom proposed. In this study, the transient model of subgap DOS is discussed for amorphous In-Ga-Zn-O (a-IGZO) thin films. This model suggests the subgap DOS exhibits a transient behavior with an exponential distribution on the band edge and a Gaussian distribution in the deep gap level. This study could be helpful to understand and optimize the transient electrical properties of a-IGZO TFTs. (C) 2015 Published by Elsevier Ltd.
机译:提出了用于研究基于氧化物的薄膜晶体管中的陷阱密度的瞬态子带隙状态密度(DOS)建模。该研究基于瞬态测量和物理模型。历史上,已经根据静态电流-电压特性或电容-电压曲线研究了陷阱密度的亚能级DOS模型。但是,很少提出瞬态曲线的子间隙DOS建模。在这项研究中,讨论了非晶In-Ga-Zn-O(a-IGZO)薄膜的亚能级DOS瞬态模型。该模型表明,亚带隙DOS表现出一种瞬态行为,其带隙边缘呈指数分布,而深带隙水平呈高斯分布。这项研究可能有助于理解和优化a-IGZO TFT的瞬态电性能。 (C)2015年由Elsevier Ltd.出版

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