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Direct observation of changes in the effective minority-carrier lifetime of SiNx-passivated n-type crystalline-silicon substrates caused by potential-induced degradation and recovery tests

机译:直接观察由电位诱导的降解和恢复测试引起的SiNx钝化的n型晶体硅衬底的有效少数载流子寿命的变化

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We directly observed reductions in the effective minority-carrier lifetime (tau(eff)) of n-type crystalline silicon (c-Si) substrates with silicon-nitride passivation films caused by potential-induced degradation (PID). We prepared PID-test samples by encapsulating the passivated substrates with standard photovoltaic-module encapsulation materials. After PID tests applying 1000 V to the c-Si samples from the glass surface, the tau(eff) was decreased, which probably pertains to Na introduced into the c-Si. After PID tests applying + 1000 V, the sample, on the other hand, showed a considerably rapid tau(eff) reduction, probably associated with the surface polarization effect. We also performed recovery tests of predegraded samples, by applying a bias opposite to that used in a degradation test. The tau(eff) of a sample predegraded by applying + 1000 V was rapidly completely recovered by applying - 1000 V, while those of predegraded by applying - 1000 V show only slight and insufficient tau(eff) recovery.
机译:我们直接观察到由于电势诱发的退化(PID)导致的具有氮化硅钝化膜的n型晶体硅(c-Si)衬底的有效少数载流子寿命(tau(eff))降低。我们通过用标准的光伏模块封装材料封装钝化的基板来制备PID测试样品。在从玻璃表面向c-Si样品施加1000 V的PID测试后,tau(eff)降低了,这可能与引入c-Si的Na有关。另一方面,在施加+ 1000 V的PID测试之后,样品显示出相当快的tau(eff)降低,可能与表面极化效应有关。我们还通过施加与降解测试中所使用的相反的偏压,对预降解样品进行了恢复测试。通过施加-1000 V可以快速完全恢复通过施加+ 1000 V预降解的样品的tau(eff),而通过施加-1000 V进行预降解的样品的tau(eff)仅显示出很少且不足的tau(eff)恢复。

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