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Exploration of robustness limits and ESD EMI impact in a protection device for advanced CMOS technology

机译:探索用于先进CMOS技术的保护设备中的鲁棒极限和ESD EMI影响

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The electrostatic discharge (ESD) protection is pivotal for advanced CMOS technology manufacturing. Today, several robust solutions are available on the market with sufficient robustness and compliance with the ESD window. In the context of solution optimization and exploration of the initial performance limits it is interesting to investigate a protection beyond its initial feature specification (the usual target is: 1 kV HBM, 250 V CDM). This analysis contributes to a better understanding of the internal behaviour and allows us to push the final performance limits of the device. This study is based on a single SCR/diode device where ESD and EMI in the device are extracted to localize the possible weak spots. 3D simulation approach allocates the potential damage locations that are confirmed by failures analysis. The results are useful for improving the device robustness against ESD events and lead to more competitive design. Moreover, it is well known that the fail mechanism involves several physical, electrical and layout parameters with their variabilities. We conclude that additional information of magnetic field intensities and current densities are useful to enhance the understanding of the failure events. (C) 2017 Published by Elsevier Ltd.
机译:静电放电(ESD)保护对于先进的CMOS技术制造至关重要。如今,市场上有几种坚固耐用的解决方案,它们具有足够的坚固性并符合ESD窗口要求。在解决方案优化和探索初始性能极限的情况下,研究超出其初始特征规格的保护很有趣(通常的目标是:1 kV HBM,250 V CDM)。这种分析有助于更好地了解内部行为,并使我们能够突破设备的最终性能极限。这项研究基于单个SCR /二极管设备,其中提取了设备中的ESD和EMI以定位可能的弱点。 3D仿真方法分配了通过故障分析确认的潜在损坏位置。结果有助于提高器件抗ESD事件的鲁棒性,并导致更具竞争力的设计。此外,众所周知,失效机制涉及若干物理,电气和布局参数及其可变性。我们得出结论,磁场强度和电流密度的其他信息可用于增强对故障事件的理解。 (C)2017由Elsevier Ltd.发布

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