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机译:TID辐射和热载流子应力在130nm短沟道PDSOI NMOSFET中引起的降解
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, Beijing 10004, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, Beijing 10004, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, Beijing 10004, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China|Univ Chinese Acad Sci, Beijing 10004, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China;
Partially-depleted SOI; Total ionizing dose; Hot-carrier degradation; Buried oxide;
机译:X射线辐照和通道热载流子应力在封闭布局的130nm NMOSFET中引起的退化
机译:具有浅沟槽隔离的0.13-μmPDSOI nMOSFET增强了辐射诱导的窄沟道效应
机译:高温下沟道热载流子应力作用下短沟道晶体管的竞争性降解机理
机译:热载应力下LDD nMOSFET的串联电阻和有效沟道迁移率下降
机译:脉冲激光辐照诱发的钼,镍和铋单晶表面缺陷结构的研究:LEED和单正氦离子通道(热应力,滑动,位移)表征。
机译:相关时间-0和热载波应力诱导FinFET参数变量:建模方法
机译:由于高场,热载流子和辐射应力,n沟道多晶硅TFT的器件性能下降
机译:双极晶体管中热载流子应力与电离诱导退化的相关性