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Low-voltage triggering SCRs for ESD protection in a 0.35 mu m SiGe BiCMOS process

机译:用于0.35μmSiGe BiCMOS工艺中的ESD保护的低压触发SCR

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摘要

A heterojunction bipolar transistor (HBT) trigger Silicon Controlled Rectifier (SCR) device (HTSCR) in the 0.35 mu m Silicon-germanium (SiGe) BiCMOS technology is proposed for Electrostatic Discharge (ESD) protection in this paper. The trigger voltage of the HTSCR is decided by the collector-to-emitter breakdown voltage of the HBT structure in floating base configuration (BVCEO). The underlying physical mechanisms critical to the trigger voltage are demonstrated based on the transmission line pulsing (UP) measurement results and physics-based simulation results. The experiment results show that the trigger voltage of the fabricated HTSCR reduces to less 64% of that of the conventional MLSCR, and I-t2 of the HTSCR is 80% more than that of the conventional MLSCR. In order to reduce the chip area, an optimized HTSCR (OHTSCR) is also proposed. The OHTSCR has a smaller layout area and a lower trigger voltage. (C) 2017 Elsevier Ltd. All rights reserved.
机译:本文提出了一种在0.35μm硅锗(SiGe)BiCMOS技术中的异质结双极晶体管(HBT)触发可控硅(SCR)器件(HTSCR),用于静电放电(ESD)保护。 HTSCR的触发电压由浮动基极配置(BVCEO)中的HBT结构的集电极-发射极击穿电压决定。基于传输线脉冲(UP)测量结果和基于物理的仿真结果,展示了对触发电压至关重要的潜在物理机制。实验结果表明,所制备的HTSCR的触发电压降低到常规MLSCR的触发电压的64%以下,HTSCR的I-t2比常规MLSCR的触发电压高80%。为了减小芯片面积,还提出了一种优化的HTSCR(OHTSCR)。 OHTSCR具有较小的布局面积和较低的触发电压。 (C)2017 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Microelectronics & Reliability》 |2017年第6期|122-128|共7页
  • 作者单位

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrate Device, Chengdu, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrate Device, Chengdu, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrate Device, Chengdu, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrate Device, Chengdu, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrate Device, Chengdu, Peoples R China;

    Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrate Device, Chengdu, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Heterojunction bipolar transistor (HBT); Silicon Controlled Rectifier (SCR); Electrostatic discharge (ESD); Trigger voltage;

    机译:异质结双极晶体管(HBT);硅控整流器(SCR);静电放电(ESD);触发电压;

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