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The role of electronic energy loss in SHI irradiated Ni/oxide/n-GaP Schottky diode

机译:电子能量损失在SHI辐照Ni /氧化物/ n-GaP肖特基二极管中的作用

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The impact of energy loss mechanism by 100 MeV Au8+ ion on the dielectric parameters of Ni/oxide/n-GaP Schottky diode was studied under different fluences. The Schottky barrier height, donor ion concentration and interface states density of the diode were varied considerably under different ion fluence. The various dielectric parameters were altered significantly by the ion fluence. The reduction in dielectric constant after irradiation was ascribed to screening of space charge polarization due to reduction in interface states density. The relaxation peak of imaginary electric modulus indicates hopping type conduction mechanisms in the intermediate voltage range. The sensitive behavior of dielectric parameters with fluence dose was attributed to the alteration of interface state density due to high electronic energy loss of 100 MeV Au8+ ions at the interface. (C) 2016 Elsevier Ltd. All rights reserved.
机译:研究了在不同注量下100 MeV Au8 +离子能量损失机理对Ni /氧化物/ n-GaP肖特基二极管介电参数的影响。在不同的离子通量下,二极管的肖特基势垒高度,施主离子浓度和界面态密度变化很大。离子通量极大地改变了各种介电参数。辐照后介电常数的降低归因于由于界面态密度降低而引起的空间电荷极化的屏蔽。虚数模量的弛豫峰表示在中间电压范围内的跳跃型传导机制。介电参数对注量剂量的敏感行为归因于界面态密度的改变,这归因于界面处100 MeV Au8 +离子的高电子能量损失。 (C)2016 Elsevier Ltd.保留所有权利。

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