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Effects of finger dimension on low-frequency noise and optoelectronic properties of Ge metal-semiconductor-metal photodetectors with interdigitated Pt finger electrodes

机译:手指尺寸对带指状Pt指状电极的Ge金属-半导体-金属光电探测器的低频噪声和光电性能的影响

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摘要

We investigated the effect of interdigitated Pt finger electrode dimension on the low-frequency noise and optoelectrical properties of Ge metal-semiconductor-metal (MSM) infrared photodetectors (PDs). This dark current reduction led to an increase in the normalized photo current to dark current ratio (NPDR). The decrease in finger width/spacing facilitated the occurrence of the electric field crowding near contact electrode. This resulted in the image-force Schottky barrier lowering, which could be responsible for the increase in dark current. From the low frequency noise measurements performed at the frequencies in the range of 10 Hz-1 kHz, the Ge MSM PDs had 1/f(gamma) frequency dependence with 7 ranging from 1.07 to 1.20, regardless of finger dimension. The current crowding, in particular at the vicinity of the finger electrodes, was more pronounced in the Ge MSM PDs having smaller finger width/spacing, which could be a main cause of the increase in the low frequency noise. (C) 2016 Elsevier Ltd. All rights reserved.
机译:我们研究了交指的Pt指状电极尺寸对Ge金属-半导体-金属(MSM)红外光电探测器(PDs)的低频噪声和光电性能的影响。这种暗电流的减少导致归一化光电流与暗电流之比(NPDR)的增加。手指宽度/间距的减小有助于在接触电极附近发生电场拥挤。这导致肖特基势垒的图像力降低,这可能是暗电流增加的原因。根据在10 Hz-1 kHz范围内的频率执行的低频噪声测量,Ge MSM PD具有1 / f(gamma)频率依赖性,与7的范围从1.07到1.20无关,而与手指尺寸无关。在具有较小的手指宽度/间距的Ge MSM PD中,特别是在手指电极附近的电流拥挤更加明显,这可能是低频噪声增加的主要原因。 (C)2016 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Microelectronics & Reliability》 |2017年第2期|60-65|共6页
  • 作者单位

    Chonbuk Natl Univ, Sch Semicond & Chem Engn, Semicond Phys Res Ctr, Jeonju 561756, South Korea;

    Chonbuk Natl Univ, Sch Semicond & Chem Engn, Semicond Phys Res Ctr, Jeonju 561756, South Korea|Mongolian Univ Sci & Technol, Sch Informat & Commun Technol, Ulaanbaatar 5129, Mongol Peo Rep;

    Chonbuk Natl Univ, Sch Semicond & Chem Engn, Semicond Phys Res Ctr, Jeonju 561756, South Korea;

    Korea Basic Sci Inst, Adv Nano Surface Res Grp, Daejeon 305806, South Korea;

    Korea Polytech Univ, Dept Nanoopt Engn, Shihung 429793, South Korea;

    Chonbuk Natl Univ, Sch Semicond & Chem Engn, Semicond Phys Res Ctr, Jeonju 561756, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Ge MSM photodetector; Dark current; NPDR; 1/f noise; Electric field crowding; Current crowding;

    机译:Ge MSM光电探测器;暗电流;NPDR;1 / f噪声;电场拥挤;电流拥挤;

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