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Temperature effects on BTI and soft errors in modern logic circuits

机译:温度对BTI的影响以及现代逻辑电路中的软错误

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Since thermal responses of the drive current in recent 3D FinFET and conventional planar transistors are different, addressing performance and reliability in advanced VLSI circuits must be reconsidered. This study investigates temperature effects on two of the most problematic reliability issues in modern logic circuits, namely Bias Temperature Instability (BTI) and soft errors. In particular, we initially examine the inversion of temperature effect that strengthens the drive current in 14-nm bulk tri-gate FinFETs with increasing temperature, and model it as a source of threshold voltage reduction. This temperature-induced threshold voltage variation is consequently adapted into our proposed simulation and analysis framework for STI degradation in large combinational circuits. The BTI aging results from our proposed estimation are more pessimistic than that from the conventional approach where the temperature effect is excluded. Simulation results show that long-term BTI aging delay worsens as temperature increases, yet the domination of thermal effect on the drive current leads to overall performance improvement in all circuits under 10-year BTI stress. In addition, soft errors and their masking probabilities in logic circuits are addressed under the inversion of temperature effect and supply voltage variation. The results reveal that soft error immunity in all experimental circuits improves significantly with increasing supply voltage and temperature, mainly due to the increase of critical charge. The average relative soft error rate when the supply voltage changes from 0.4 V to 0.6 V and 0.8 V at 0 degrees C is as low as 3.7% and 0.08% of the average result at 0.4 V, respectively. On average, the relative soft error rate at a particular supply voltage when temperature changes from 0 degrees C to 40 degrees C, 80 degrees C, and 120 degrees C is around 70%, 50%, and 30% of the average result at 0 degrees C, respectively.
机译:由于最近的3D FinFET和常规平面晶体管中驱动电流的热响应不同,因此必须重新考虑先进VLSI电路的寻址性能和可靠性。这项研究调查了温度对现代逻辑电路中两个最成问题的可靠性问题的影响,即偏置温度不稳定性(BTI)和软错误。特别是,我们首先检查温度效应的反转,该效应会随着温度的升高而增强14nm体三栅FinFET的驱动电流,并将其建模为阈值电压降低的来源。因此,这种温度引起的阈值电压变化适用于我们提出的用于大型组合电路中STI退化的仿真和分析框架。我们提出的估计得出的BTI老化结果比不考虑温度影响的传统方法更为悲观。仿真结果表明,随着温度的升高,长期的BTI老化延迟会加剧,但是对驱动电流的热影响占主导地位的结果是,在10年BTI压力下,所有电路的整体性能都会得到改善。此外,在温度效应和电源电压变化的反转下,可以解决逻辑电路中的软错误及其掩盖概率。结果表明,所有实验电路中的软错误抗扰性均随着电源电压和温度的升高而显着提高,这主要是由于临界电荷的增加。电源电压在0摄氏度时从0.4 V变为0.6 V和0.8 V时的平均相对软错误率分别低至0.4 V时平均结果的3.7%和0.08%。平均而言,当温度从0摄氏度变为40摄氏度,80摄氏度和120摄氏度时,特定电源电压下的相对软错误率约为0时平均结果的70%,50%和30%摄氏度。

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