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NBTI: Experimental investigation, physical modelling, circuit aging simulations and verification

机译:NBTI:实验研究,物理建模,电路老化仿真和验证

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摘要

For more than 10 years a major part of MOSFET reliability publications are dealing with (N)BTI. The degradation and recovery mechanism is still not fully understood (Grasser, 2014). New publications demonstrate incessantly the agile debate on this important transistor aging phenomenon.& para;& para;In this paper we want to illuminate four important subareas for the understanding of NBTI. First, we will discuss experimental investigations. Depending on the pursued goal of the measurements different set-ups are required to gain the desired information. To get meaningful statements regarding the median NBTI degradation of MOSFET with a relatively small number of test devices, e.g. for regular lifetime predictions, DUTs with larger active area are used. The relatively high number of defects within one transistor delivers stable (averaged) parameter shifts with a small number of DUTs. Relatively small area devices are the best choice to investigate the physical nature of the degradation and recovery mechanisms. The small number of defects within those devices enables to obtain and investigate the trapping and de-trapping of single charges. To investigate the NBTI impact on the parameter variability array structures with a higher number of devices under test (DUTs) are appropriate. The very fast and strong recovery behavior of NBTI has to be considered for the test structure design and for the measurement set-up.& para;& para;Based on the measurement results and gained knowledge we can refine the modelling of the degradation and recovery mechanism. We could improve the understanding of the temperature dependence and utilize this knowledge to reduce measurement efforts for model calibration for a circuit aging simulator (Pobegen and Grasser, 2013). An adequately accurate model at a manageable effort for characterization and implementation is a key factor for a successful integration of an aging simulator in the design flow. A correct modelling of the parameter recovery during circuit function is especially challenging.& para;& para;The last chapter introduces a new method to verify the NBTI model and the correct implementation into a circuit aging simulator with real hardware measurements. An arbitrary waveform generator is used to drive single transistors in identical operation modes with identical sequence and proportion of each single operating point as during real circuit operation. In this manner, the calculated drift for one transistor in a circuit can be compared with a measurement drift for a given stress pattern.
机译:十多年来,MOSFET可靠性出版物的主要部分涉及(N)BTI。降解和恢复机制仍未完全了解(Grasser,2014年)。新出版物不断地展示了关于这种重要晶体管老化现象的敏捷辩论。在本文中,我们想阐明四个重要的子领域,以供人们了解NBTI。首先,我们将讨论实验研究。根据测量的追求目标,需要不同的设置以获得所需的信息。为了获得有意义的陈述,说明使用相对较少数量的测试设备(例如,对于常规的寿命预测,使用具有较大有效面积的DUT。一个晶体管内相对大量的缺陷会以少量的DUT提供稳定的(平均)参数偏移。相对较小的设备是研究降解和恢复机制的物理性质的最佳选择。这些设备中的少量缺陷能够获取和研究单个电荷的俘获和去俘获。为了研究NBTI对参数可变性阵列结构的影响,采用更多数量的被测设备(DUT)是合适的。在测试结构设计和测量设置中必须考虑NBTI的非常快速和强大的恢复性能。¶¶基于测量结果和获得的知识,我们可以完善降解和恢复的模型机制。我们可以改善对温度依赖性的理解,并利用这些知识来减少用于电路老化模拟器的模型校准的测量工作(Pobegen和Grasser,2013年)。足够准确的模型以可管理的方式进行表征和实现,这是在设计流程中成功集成老化模拟器的关键因素。在电路功能期间对参数恢复进行正确建模尤其具有挑战性。上一章介绍了一种新方法,可以验证NBTI模型并在具有真实硬件测量结果的电路老化仿真器中正确实现。与真实电路操作期间一样,使用任意波形发生器以相同的操作模式以相同的顺序和每个单个工作点的比例驱动单个晶体管。这样,可以将电路中一个晶体管的计算漂移与给定应力模式的测量漂移进行比较。

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