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Modeling and simulation of the charge trapping component of BTI and RTS

机译:BTI和RTS的电荷捕获组件的建模和仿真

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摘要

Charge trapping phenomena is known to be a major reliability concern in modern MOSFETS, playing a significant role in aging through Bias Temperature Instability (BTI) and dominating low-frequency noise behavior. An electrical level modeling and simulation approach, valid at DC, AC and transient operation conditions is presented. Detailed statistical analysis is provided, aiming at proper modeling of BTI and noise variability, as well as to facilitate the understanding of physical mechanisms behind BTI and noise that are difficult to obtain otherwise. Case studies relevant for practical applications and understanding of the basic mechanisms are presented and critically discussed.
机译:众所周知,电荷陷阱现象是现代MOSFET的主要可靠性问题,它在偏置温度不稳定性(BTI)的老化和主导低频噪声行为方面起着重要作用。提出了一种在直流,交流和瞬态运行条件下均有效的电气水平建模和仿真方法。提供了详细的统计分析,旨在对BTI和噪声变异性进行正确的建模,并有助于理解BTI和噪声背后的物理机制,否则很难获得这些机制。提出并批判性地讨论了与实际应用相关的案例研究,并了解了基本机制。

著录项

  • 来源
    《Microelectronics & Reliability》 |2018年第1期|278-283|共6页
  • 作者单位

    Univ Fed Rio Grande do Sul, Programa Posgrad Microeletron PGMicro, Porto Alegre, RS, Brazil;

    Univ Fed Rio Grande do Sul, Programa Posgrad Microeletron PGMicro, Porto Alegre, RS, Brazil;

    Univ Fed Rio Grande do Sul, Programa Posgrad Microeletron PGMicro, Porto Alegre, RS, Brazil;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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