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首页> 外文期刊>Microelectronics & Reliability >Degradation of AlGaAs/GaAs Power HFET's Under On-State and Off-State Breakdown Conditions
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Degradation of AlGaAs/GaAs Power HFET's Under On-State and Off-State Breakdown Conditions

机译:导通和断态击穿条件下AlGaAs / GaAs功率HFET的降解

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This work shows a detailed comparision of the degradation caused by off-state breakdown conditions in power AlGaAs/GaAs HFET's Stress experimetns carried out at gate-drain reverse currents up to 3.3mA/mm (for a total of more than 700h) show a remarkably larger degradation for the off-state stress, due to more pronounced electron heating at any fixed value of galue of gate reverse current. The degradation modes include V_T and R_D increase and 1_DSS and gm reduction.
机译:这项工作详细地比较了功率AlGaAs / GaAs HFET的关态击穿条件引起的性能下降,该功率实验在高达3.3mA / mm的栅极-漏极反向电流(总计超过700h)下进行,显示出显着的性能下降。由于在栅极反向电流的任何固定值下更明显的电子加热,关态应力的衰减更大。降级模式包括V_T和R_D增大以及1_DSS和gm减小。

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