Model-independent determination of the degradation dynamics of thin SiO_2 films

摘要

The degradation dynamics of thin SiO_2 films is analyzed using a two-step stress procedure. The results point out that the degradation proceeds in tow stages (with quite different time constants) which have an effect in the current evolution. It is shown that the fitting of the I-t characteristics can provide quantitiative information on the degradation (degradation rate) and breakdown (mean-time-to-breakdown),without any assumption on the degradation emchanism.