Carrier influence of semiconductor devices is important as it affects the funciton of the device. In this experimetn, the carrier density distribution in the cross-section of semiconductor device was analyzed by SCM: Scanning Capacitance Microscope which is one of the measuring mode of SPM: Scanning Probe Microscope. This paper describe measurement result of change in carrier dencsity by the gate voltage at p channel area fo CMOS device and its efficiency to investigating dopant profile on 16MDRAM cross-section.
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