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Experiences on reliability simulation in the framework of the qPROPHECY project

机译:在qPROPHECY项目框架中进行可靠性仿真的经验

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Electromigration and oxide time dependent dielectric brakdown simulations based on library elements of a 0.35μm CMOS technology have been performed. In the case fo hot carrier degradation simulations as well as experiments using 99-stage ring osicllators fo the same 0.35μm CMOS technology have been carried ouThe frequency behaviour as a function of supply voltage and temperature has been investigated. Relaxation effects on the ring oscillators have been found. These effects are not covered by the reliabiltiy simulation tool. In a certain region of suply voltage and operation time the results of simulations could be confirmed by experimets. In all other cases the measured frequency degradation was smaller than the simulated degradation.
机译:已经基于0.35μmCMOS技术的库元素进行了电迁移和氧化物相关的电击穿模拟。在热载流子退化仿真以及使用相同0.35μmCMOS技术的99级环形振荡器进行实验的情况下,研究了频率特性与电源电压和温度的关系。已经发现对环形振荡器的弛豫效应。可靠性仿真工具未涵盖这些影响。在一定的电压和工作时间范围内,仿真结果可以通过实验证实。在所有其他情况下,测得的频率降级小于模拟降级。

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