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High-energy proton irradiation effects on GaN hybrid-drain-embedded gate injection transistors

机译:GaN混合排水嵌入式栅极注入晶体管的高能量质子辐照效应

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The characterization of commercial-grade power transistors upon high levels of particle irradiation is required to enable radiation tolerant LED power supplies for the new luminaires of CERN accelerator tunnels, which represent a harsh environment for semiconductor devices. This work describes the effects of 24 GeV/c proton irradiation on commercial GaN hybrid-drain-embedded gate injection transistors (HD-GITs) after a fluence of 5.9 x 10(14) p/cm(2). Measurements of drain leakage current, threshold voltage and I-ds - V-ds curves show that only a minor variation occurs in the electrical properties of GaN HD-GITs after the considered fluence; for example, an average increase of approximate to 11-13 mV is found in the threshold voltage upon irradiation. We also put forward a physical explanation of the observed degradation caused by proton irradiation; in particular, the electron drift velocity in the 2DEG channel at high electric fields appears to decrease due to a radiation-induced increase in phonon relaxation rate. Finally, an AC/DC LED power supply with current control using GaN HD-GITs is proposed for the new luminaires of CERN tunnels, meeting the requirements in terms of radiation hardness and light quality.
机译:需要在高水平的粒子照射时进行商业级功率晶体管的表征,以使辐射容忍的LE​​D电源用于CERN加速器隧道的新灯具,这代表了半导体器件的恶劣环境。这项工作描述了在5.9×10(14)p / cm(2)的流量后24 gev / c质子辐射对商业GaN混合 - 漏嵌入式栅极注入晶体管(HD-gits)的影响。漏极泄漏电流,阈值电压和I-DS - V-DS曲线的测量表明,在考虑的流量之后只发生在GaN HD-GIT的电学特性中的次要变化;例如,在照射时,在阈值电压下发现近似为11-13 mV的平均增加。我们还提出了由质子辐射引起的观察到的降解的物理解释;特别地,由于辐射引起的声子松弛率的增加,高电场的2deg通道中的电子漂移速度似乎降低。最后,为CERN隧道的新灯具提出了使用GaN HD-GITS的电流控制的AC / DC LED电源,满足辐射硬度和光质质量方面的要求。

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