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Trap induced negative differential conductance and back-gated charge redistribution in AlGaN/GaN power devices

机译:陷阱引起的AlGaN / GaN功率器件中的负差分电导和背栅电荷重新分布

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Negative differential conductance (NDC) seen in the drain current saturation region is typically attributed to self-heating effects in GaN HEMTs. In this paper, it is demonstrated that NDC is due to trap states in the buffer resulting from poor carrier confinement in the channel during saturation which leads to stray electrons exiting the channel and becoming trapped. Substrate bias testing has been used to confirm that severe current collapse occurs when those electrons are forced to the surface, and that NDC occurs when the carriers are forced to the buffer. In addition to this, pulsed I-V characterization is performed among other tests to isolate the cause of NDC in the saturation region, which effectively eliminated trapping mechanisms that lead to gate- and drain-lag from contributing to NDC. To the best of our knowledge, we are the first to report NDC not as a result of self-heating, but due to trapping within the buffer.
机译:在漏极电流饱和区域中看到的负差分电导(NDC)通常归因于GaN HEMT中的自热效应。在本文中,证明了NDC是由于饱和期间由于沟道中载流子限制较弱而导致的缓冲区中的陷阱状态,从而导致杂散电子离开沟道并被捕获。衬底偏置测试已用于确认当那些电子被迫进入表面时会发生严重的电流崩塌,而当载流子被迫进入缓冲器时会发生NDC。除此之外,在其他测试中还执行了脉冲I-V表征,以隔离饱和区域中NDC的原因,从而有效消除了导致栅极和漏极滞后的电荷捕获机制对NDC的贡献。据我们所知,我们是第一个报告NDC的原因,它不是由于自热引起的,而是由于缓冲区内的陷印所致。

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