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Failure mechanisms of enhancement mode GaN power HEMTs operated in short circuit

机译:增强型GaN功率HEMT短路工作的失效机理

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The paper reports the results of a study based on experimental data and finite element simulations about the failure mechanism of 650 V p-doped GaN power HEMT operated in short circuit condition. The study focuses on the failure observed during the short circuit of these devices when the test voltage is larger than 350 V. In this failure mode, the energy involved is quite low and the time to failure is < 1 mu s. Simulation results show that in these test conditions a very high-power density is dissipated in a critical region of the device and it is intensified by a significant current focalization which has been proved by experimental observations. It is demonstrated that the temperature in the critical region can reach the maximum allowable temperature for a GaN/AlGaN structure.
机译:本文基于实验数据和有限元模拟报告了有关在短路条件下工作的650 V p掺杂GaN功率HEMT失效机理的研究结果。研究重点是当测试电压大于350 V时,在这些设备短路期间观察到的故障。在这种故障模式下,所涉及的能量非常低,故障时间小于1μs。仿真结果表明,在这些测试条件下,器件的关键区域耗散了非常高的功率密度,并且通过大量的电流聚焦得到了增强,这已经通过实验观察得到了证明。结果表明,关键区域的温度可以达到GaN / AlGaN结构的最大允许温度。

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