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Power cycling and temperature endurance test of a GaN switching cell with substrate integrated chips

机译:具有衬底集成芯片的GaN开关单元的功率循环和耐温性测试

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摘要

We present a reliability study of a half-bridge switching cell with substrate integrated 650 V GaN HEMTs. Power Cycling Testing with a Delta T-j of 100 K has revealed thermo-mechanically induced failures of contact vias after more than 220 kcycles. The via failure mode of contact opening is confirmed by reverse-bias pulsed IV-measurements to be primarily triggered by a Delta T-j/imposed thermal gradient and not by a high T-j. The chip electrical characteristics, however, remained unaffected during Power Cycling. Furthermore, a High Temperature Storage test at 125 degrees C for 5000 h has shown no changes in the electrical performance of substrate integrated GaN HEMTs.
机译:我们介绍了具有衬底集成650 V GaN HEMT的半桥开关单元的可靠性研究。 Delta T-j为100 K的功率循环测试表明,在超过220 kcycles之后,热机械引起的接触通孔失效。触点断开的通孔失效模式由反向偏置脉冲IV测量确定,主要是由Delta T-j /施加的热梯度而不是高T-j触发的。但是,芯片的电气特性在重启后仍然不受影响。此外,在125摄氏度下进行了5000小时的高温存储测试表明,集成衬底的GaN HEMT的电性能没有变化。

著录项

  • 来源
    《Microelectronics & Reliability》 |2019年第9期|113372.1-113372.6|共6页
  • 作者单位

    Tech Univ Appl Sci Rosenheim D-83024 Rosenheim Germany;

    Tech Univ Munich Chair Elect Drive Syst & Power Elect D-80333 Munich Germany;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

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