首页> 外文期刊>Microelectronics & Reliability >Reliability analysis through linearity and harmonic distortion of a dual-material-gate asymmetric underlapped DGMOSFET
【24h】

Reliability analysis through linearity and harmonic distortion of a dual-material-gate asymmetric underlapped DGMOSFET

机译:通过双材料栅极不对称欠重叠DGMOSFET的线性和谐波失真进行可靠性分析

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper, Harmonic Distortion (HD) of a Dual Material Gate Source Underlap Double Gate MOSFET (DMG-SU-DG) with different gate work function combination is examined. The HD occurs because of the non-linear response of the device and therefore, a detailed analysis of the HD keeping gate work function as a variable parameter ensure device reliability. The HD is analyzed in terms of few figures of merit (FOM) such as the primary component, the Second Order Harmonic Distortion (HD2), the Third order Harmonic Distortion (HD3) and lastly the Total Harmonic Distortion (THD). The parameters which are used to analysis of HD are the drain current, the transconductance and transconductance generation factor. The result of the analysis suggests a reduction of distortion as linearity increases with the decrease of the work function difference, between source side metal and that of the drain side. The circuit analysis is done using Single Stage Amplifier circuit. An extensive HD analysis of the aforementioned circuit, with the help of HD2, HD3 and THD along have also presented in this work.
机译:本文研究了具有不同栅极功函数组合的双材料栅极源下重叠双栅极MOSFET(DMG-SU-DG)的谐波失真(HD)。 HD的出现是由于器件的非线性响应,因此,对HD的详细分析将栅极功函数作为可变参数,可以确保器件的可靠性。对HD进行了品质因数分析(FOM),例如主要成分,二阶谐波失真(HD2),三阶谐波失真(HD3)和总谐波失真(THD)。用于分析高清的参数是漏极电流,跨导和跨导生成因子。分析结果表明,随着源极侧金属和漏极侧金属之间的功函数差的减小,线性随着线性增加而减小。使用单级放大器电路进行电路分析。这项工作还介绍了对上述电路的广泛的高清分析,以及HD2,HD3和THD的帮助。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号