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Effect of power cycling tests on traps under the gate of Al_2O_3/AlGaN/GaN normally-ON devices

机译:功率循环测试对Al_2O_3 / AlGaN / GaN常开器件栅极下方陷阱的影响

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摘要

GaN-based power components are known to exhibit reversible instabilities in their electrical characteristics, particularly in the threshold voltage and in the on-state resistance. This is due to trap effects in the structure. Works presented in this paper attempt to answer the question of how are these traps affected during aging by power cycling and especially if there is irreversible degradation. For this purpose, power cycling tests were performed using 80 K of junction temperature swing on Normally-ON Al2O3/AlGaN/GaN MOS-HEMTs power chips reported on a direct copper bonding (DCB) substrate. The aging has been regularly interrupted in order to perform characterization of several aging indicators. Furthermore, trap characterizations, based on the analyses of transient current measurements, have been carried out during the aging process. The results show that irreversible degradation affects threshold voltage with drift to negative values for all tested samples. These drifts were mainly attributed to cumulative trapping with power cycles, probably induced by hot electrons, in a progressive and non-recoverable way.
机译:已知基于GaN的功率组件在其电特性(尤其是阈值电压和导通电阻)中表现出可逆的不稳定性。这是由于结构中的陷阱效应所致。本文提出的工作试图回答这些陷阱在电源老化过程中如何受到影响,特别是如果存在不可逆的退化时。为此,在直接铜键合(DCB)基板上报道的Normal-ON Al2O3 / AlGaN / GaN MOS-HEMT功率芯片上使用80 junctionK的结温摆幅进行了功率循环测试。为了执行几个老化指示器的表征,已经定期中断了老化。此外,在老化过程中已经基于瞬态电流测量的分析对陷阱进行了表征。结果表明,所有测试样品的不可逆降解都会影响阈值电压,并漂移到负值。这些漂移主要归因于功率周期的累积陷获,这可能是由热电子以渐进且不可恢复的方式引起的。

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