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Impact of elevated temperature applied during low dose rate irradiation on the degradation of BiCMOS operational amplifiers

机译:低剂量率辐照期间施加的高温对BiCMOS运算放大器性能的影响

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The radiation-induced change in input bias current of bipolar input stage of BiCMOS operational amplifiers susceptible to enhanced low dose rate sensitivity (ELDRS) is studied as a function of the dose rate of gamma-irradiation and of the temperature applied during irradiation. Experimental results and results of the simulation with the conversion model of radiation-induced interface traps formation have shown that degradation enhancement factorKDprovided by the temperature applied during irradiation exhibits a nonmonotonic dependence on the dose rate: an elevated temperature provides the maximum increase in the degradation, if the dose rate is chosen from the range 0.1–1 rad(Si)/s, while irradiation with high (≥101 rad(Si)/s) and low dose rate (≤10−2 rad(Si)/s) provides approximately the same values ofKD. This range can be recommended for accelerated testing of bipolar and BiCMOS devices, if enhanced degradation in low dose rate conditions of space application is modeled by irradiation at elevated temperature.
机译:研究了易受增强的低剂量率灵敏度(ELDRS)影响的BiCMOS运算放大器的双极输入级的输入偏置电流的辐射诱导变化,它是伽马辐照剂量率和辐照期间施加温度的函数。实验结果和利用辐射诱导的界面陷阱形成转换模型进行的仿真结果表明,由辐射过程中施加的温度提供的降解增强因子KD表现出对剂量率的非单调依赖性:升高的温度可最大程度地提高降解,如果剂量率选自0.1–1 rad(Si)/ s,而高剂量照射(≥101rad(Si)/ s)和低剂量照射(≤10-2rad(Si)/ s)可提供KD值大致相同。如果通过在高温下辐照来模拟低剂量率空间应用中的增强降解,则可以建议将该范围推荐用于双极和BiCMOS器件的加速测试。

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