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Effects of HPEM stress on GaAs low-noise amplifier from circuit to component scale

机译:HPEM应力对从电路到元件规模的GaAs低噪声放大器的影响

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摘要

This paper presents a study of High Power Electromagnetics (HPEM) stress effects on a GaAs (Gallium Arsenide) low-noise amplifier (LNA). This work aims to evaluate such electrical stress effect from circuit to component scale in relation to more general Intentional electromagnetic interference (IEMI) studies. Conducted susceptibility measurements were made on a specifically designed device under test (DUT). Those experiments yielded interesting results concerning exposition of the DUT to destructive values of interference power, as well as its response to non-destructive but significant powers. The destruction process has been analyzed using time-domain and frequency-domain measurements.
机译:本文介绍了高功率电磁(HPEM)应力对GaAs(砷化镓)低噪声放大器(LNA)的影响。这项工作旨在评估与更一般的故意电磁干扰(IEMI)研究相关的从电路到元件规模的这种电应力影响。在专门设计的被测设备(DUT)上进行了磁化率测量。这些实验产生了有趣的结果,涉及将DUT暴露于干扰功率的破坏性值,以及其对非破坏性但显着功率的响应。已经使用时域和频域测量分析了破坏过程。

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