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An analytical 2D model for drain-induced barrier lowering in subquarter micrometer gate length InAlAs/InGaAs/InAlAs/InP LMHEMT

机译:在亚微米级栅极长度InAlAs / InGaAs / InAlAs / InP LMHEMT中,漏极引起的势垒降低的二维分析模型

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摘要

This paper presents an analytical 2D model for InAlAs/InGaAs/InAlAs/InP LMHEMT that explains the drain induced barrier lowering (DIBL) and its effect on the device performance. The increasing drain voltage lowers the potential barrier between source and drain in or near the subthreshold region. As the barrier is lowered to be comparable to the thermal energy the device begins to conduct again. This effect causes the threshold voltage control problem and degrades the device performance. The model is used to obtain the potential distribution and the electric field in the depletion region and the threshold voltage is also calculated form the minimum channel potential. It is proposed as a consequence of the analysis that the device degradation due to DIBL effect is a very short channel problem.
机译:本文介绍了InAlAs / InGaAs / InAlAs / InP LMHEMT的二维分析模型,该模型解释了漏极诱导势垒降低(DIBL)及其对器件性能的影响。增加的漏极电压降低了亚阈值区域内或附近的源极和漏极之间的势垒。随着势垒降低到与热能相当的水平,设备开始重新传导。这种影响会导致阈值电压控制问题,并降低器件性能。该模型用于获得耗尽区的电势分布和电场,并且还从最小沟道电势计算阈值电压。作为分析的结果,提出了由于DIBL效应引起的器件劣化是非常短的信道问题。

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