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Implementation of nanoscale double-gate CMOS circuits using compact advanced transport models

机译:使用紧凑的高级传输模型实现纳米级双栅CMOS电路

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In this paper we present the results of the implementation of a nanoscale double-gate (DG) MOSFET compact model, which includes hydrodynamic transport model, in Verilog-A in order to carry out circuit simulation. The model in Verilog-A is used with the SMASH circuit simulator for the analysis of the DC and transient behavior electrical CMOS circuits. Template devices representative for a down-scaled symmetric double-gate MOSFET was used to validate the models for n-channel and p-channel. A CMOS inverter and a ring oscillator have been analyzed. Comparison of its performance between the drift-diffusion (DD) and hydrodynamic transport model within the practical range of bias voltages has been highlighted.
机译:在本文中,我们介绍了在Verilog-A中实现纳米级双栅极(DG)MOSFET紧凑模型的结果,其中包括流体动力传输模型,以进行电路仿真。 Verilog-A中的模型与SMASH电路模拟器一起用于分析DC和瞬态行为电子CMOS电路。代表缩小规模的对称双栅极MOSFET的模板设备用于验证n通道和p通道的模型。已经分析了CMOS反相器和环形振荡器。在偏置电压的实际范围内,漂移-扩散(DD)模型和流体动力传输模型之间的性能比较已得到了重点介绍。

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