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首页> 外文期刊>Microelectronics journal >Analytical surface potential modeling and simulation of junction-less double gate (JLDG) MOSFET for ultra low-power analog/RF circuits
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Analytical surface potential modeling and simulation of junction-less double gate (JLDG) MOSFET for ultra low-power analog/RF circuits

机译:超低功耗模拟/ RF电路的无结双栅极(JLDG)MOSFET的分析表面电势建模和仿真

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摘要

In this paper, a simple structure for short channel junction-less double gate (JLDG) MOSFET is proposed. Further expression for surface potential of JLDG has been derived using 2D Poisson's equation. Based on the proposed analytical model for surface potential distribution along channel thickness and channel length is derived. The proposed junction-less MOSFET has no p-n junction as the doping of channel is same to that of Source/Drain region. The analytical model is compared with numerical solution using ATLAS device simulator. The result shows the variation of channel potential with channel length, channel thickness, doping concentration and applied gate bias. Further, in this paper the analog performance and RF figure of merits (FOMS) have been investigated. The purpose of this research is to provide a physical explanation for improved analog and RF performance exhibited by the device. In this paper major FOMs such as trans-conductance (g(m)), output conductance (g(d)), early voltage (V-EA), intrinsic gain (A(V)), transconductance generation factor (TGF), cut-off frequency (f(T)), trans-conductance frequency product (TFP), gain frequency product (GFP), gain trans-conductance frequency product (GTFP) are analyzed. The simulation result shows that the JLDG exhibit a higher trans-conductance, higher cut-off frequency and lower drain conductance. (C) 2015 Elsevier Ltd. All rights reserved.
机译:本文提出了一种用于短沟道无结双栅极(JLDG)MOSFET的简单结构。 JLDG的表面电势的进一步表达式已使用2D泊松方程推导。基于所提出的分析模型,得出沿沟道厚度和沟道长度的表面电势分布。所提出的无结MOSFET没有p-n结,因为沟道的掺杂与源/漏区的掺杂相同。使用ATLAS设备模拟器将分析模型与数值解进行比较。结果显示了沟道电势随沟道长度,沟道厚度,掺杂浓度和施加的栅极偏压的变化。此外,本文还对模拟性能和RF优值(FOMS)进行了研究。这项研究的目的是为器件所展现的改进的模拟和RF性能提供物理解释。本文主要的FOM包括跨导(g(m)),输出电导(g(d)),早期电压(V-EA),固有增益(A(V)),跨导生成因子(TGF),分析了截止频率(f(T)),跨导频率乘积(TFP),增益跨度乘积(GFP),增益跨导频率乘积(GTFP)。仿真结果表明,JLDG具有较高的跨导,较高的截止频率和较低的漏极电导率。 (C)2015 Elsevier Ltd.保留所有权利。

著录项

  • 来源
    《Microelectronics journal》 |2015年第10期|916-922|共7页
  • 作者单位

    Motilal Nehru Natl Inst Technol, Allahabad 211004, Uttar Pradesh, India;

    Motilal Nehru Natl Inst Technol, Allahabad 211004, Uttar Pradesh, India;

    Motilal Nehru Natl Inst Technol, Allahabad 211004, Uttar Pradesh, India;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    JLDG; SCEs; Double Gate; SOI; Analog and RF FOMs;

    机译:JLDG;SCE;双门;SOI;模拟和RF表格;

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