首页> 外文期刊>Microelectronic Engineering >Completely (001)-textured growth and electrical properties of Bi_4Ti_3O_(12)/LaNiO_3 heterostructures prepared by pulsed laser deposition on LaAlO_3 single crystal substrates
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Completely (001)-textured growth and electrical properties of Bi_4Ti_3O_(12)/LaNiO_3 heterostructures prepared by pulsed laser deposition on LaAlO_3 single crystal substrates

机译:通过在LaAlO_3单晶衬底上进行脉冲激光沉积制备的Bi_4Ti_3O_(12)/ LaNiO_3异质结构的完全(001)纹理生长和电性能

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摘要

Heterostructures of Bi_4Ti_3O_(12)(BTO)/LaNiO_3(LNO) have been prepared on (001) LaAlO_3 single crystal substrates by pulsed laser deposition (PLD). Analyses of X-ray diffraction (XRD), (including θ-2θ scan, rocking curve), atomic force microscopy (AFM) and scanning electron microscopy (SEM) reveal that the high quality LNO and BTO films are completely c-axis oriented. With Pt top electrodes, the BTO films exhibit a highly insulative characteristic of low leakage current (~ 10~(-7) A/cm~2 at an applied voltage of 6 V) and excellent dielectric properties. At 100 kHz, the dielectric constant and dielectric loss are 238 and 0.033, respectively. Also a well symmetric ferroelectric hysteresis loop is observed with remnant polarization P_r of 4.5 μC/cm~2 and coercive field E_c of 72.5 kV/cm. Our experiments confirm that the use of the LNO as an electrode material can reduce the amount of the interfacial charges, and thus remove the imprint failure due to thermal processes.
机译:通过脉冲激光沉积(PLD)在(001)LaAlO_3单晶衬底上制备了Bi_4Ti_3O_(12)(BTO)/ LaNiO_3(LNO)的异质结构。 X射线衍射(XRD)(包括θ-2θ扫描,摇摆曲线),原子力显微镜(AFM)和扫描电子显微镜(SEM)的分析表明,高质量的LNO和BTO薄膜完全是c轴取向的。使用Pt顶部电极,BTO膜具有低漏电流(在施加6 V电压时约为10〜(-7)A / cm〜2)的高度绝缘特性,并且具有出色的介电性能。在100 kHz时,介电常数和介电损耗分别为238和0.033。还观察到了对称性良好的铁电磁滞回线,其剩余极化P_r为4.5μC/ cm〜2,矫顽场E_c为72.5 kV / cm。我们的实验证实,将LNO用作电极材料可以减少界面电荷的数量,从而消除由于热处理引起的压印失败。

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