Fabrication of SOI photonic crystal slabs by soft UV-nanoimprint lithography

摘要

Soft imprinting lithography assisted by UV light (soft UV-NIL) takes advantage of both, UV-nanoimprint and soft lithography. This technique, which can be applied for the replication of nanometer size features over large areas, is suitable for the patterning of nano-structures like photonic crystals with high throughput and high accuracy. In this work, we demonstrate the fabrication of two dimensional silicon-on-insulator photonic crystal slabs with and without line defects by using soft UV-NIL. Measurement of photonic mode dispersion by means of variable angle reflectance assesses the quality of the fabricated samples.