A lateral nanoscale linewidth/pitch standard for every day calibration of high-resolution microscopy techniques

摘要

We have developed a lateral standard on the nanometre scale for use with high-resolution optical microscopy techniques [U. Huebner, in: Proceedings of the 5th International Euspen Conference, 2005, pp. 185-188; U. Huebner, in: Optical Fabrication Testing, and Metrology II, Proc. SPIE 5965 (2005) 59651W]. The so-called nanoscale linewidth/pitch standard contains structures in the submi-cron- and sub-100nm scale and meets the metrological requirements for accurate, easy and traceable optical microscopy measurements. The optical contrast of the pattern in the UV wavelength range makes it suitable for transmission and reflection UV-microscopy and for confocal laser scanning microscopy. The standard can be used for pitch- and linewidth measurements and for quick resolution testing of these instruments. Additionally, the integrated circular gratings provide a new way of calibrating scanning probe microscopes.