Fabrication of nano-scaled patterns on ceramic thin films and silicon substrates by soft ultraviolet nanoimprint lithography

摘要

Soft ultraviolet nanoimprint lithography is a cost-effective and versatile technique for the transfer of nano-scaled patterns to various surfaces. Here, we report on the fabrication of sub-micron square pillar arrays in epitaxial Ba_(0.7)Sr_(0.3)TiO_3 ceramic films, using a combination of nanoimprint lithography and inductively coupled plasma etching techniques. Based on a similar approach we have also succeeded in preparing positive (direct) and negative (inverse) replicas of silicon master molds. Such a generic process could find application in various materials.