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Young's modulus evaluation by SAWs for porous silica low-k film with cesium doping

机译:通过声表面波对铯掺杂多孔二氧化硅低k薄膜的杨氏模量评估

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摘要

Young's moduli of porous silica low-k films with cesium (Cs) doping are determined by surface acoustic waves (SAWs) in this study. Four low-k samples doped with 0-30 ppm wt% Cs in the precursor solution are investigated to check the mechanical promotion of the porous silica films. The SAW determination process is performed on these ultra-thin porous films. The detected signals with the signal-to-noise ratio of 50:1 are achieved in our measurements. The signal process with combination of wavelet and FIR filter is proposed to effectively restrain the high and low frequency noises and the "Gibbs effect" of the detected signals. The smooth experimental dispersive curves with frequency range from 20 to 150 MHz, which is qualified for the data fitting process with the theoretical dispersion curves, are obtained for these detected thin low-k films. The determination results show that the mechanical property is improved with the pretreatment of cesium doping, which confirms that the degree of siloxane cross-linkage of the porous silica film is promoted by cesium doping.
机译:在这项研究中,铯(Cs)掺杂的多孔二氧化硅低k薄膜的杨氏模量由表面声波(SAW)确定。研究了在前体溶液中掺杂了0​​-30 ppm wt%Cs的四个低k样品,以检查多孔二氧化硅薄膜的机械性能。在这些超薄多孔膜上进行SAW确定处理。在我们的测量中获得了信噪比为50:1的检测信号。提出了结合小波和FIR滤波器的信号处理方法,以有效抑制高频和低频噪声以及被测信号的“吉布斯效应”。对于这些检测到的低k薄膜,获得了频率范围为20至150 MHz的平滑实验色散曲线,符合理论色散曲线,适合进行数据拟合。测定结果表明,铯掺杂的预处理改善了机械性能,这证实了铯掺杂促进了二氧化硅多孔膜的硅氧烷交联度。

著录项

  • 来源
    《Microelectronic Engineering》 |2011年第5期|p.666-670|共5页
  • 作者单位

    School of Electronic and Information Engineering, Tianjin University, Weijin Road 92, 300072 Tianjin, China,Research Institute for Nanodevices and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, 739-8527 Higashi-hiroshima, Japan;

    School of Electronic and Information Engineering, Tianjin University, Weijin Road 92, 300072 Tianjin, China;

    Research Institute for Nanodevices and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, 739-8527 Higashi-hiroshima, Japan;

    Product Development Laboratory, Mitsui Chemicals Inc., 580-32 Nagaura, Sodegaura, 299-0265 Chiba, japan;

    Product Development Laboratory, Mitsui Chemicals Inc., 580-32 Nagaura, Sodegaura, 299-0265 Chiba, japan;

    Research Institute for Nanodevices and Bio Systems, Hiroshima University, 1-4-2 Kagamiyama, 739-8527 Higashi-hiroshima, Japan;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    surface acoustic waves; low-k film; porous silica; young's modulus; cesium doping;

    机译:表面声波;低介电常数薄膜;多孔二氧化硅;杨氏模量;铯掺杂;

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