Fabrication method of double-slit-grating for high resolution microspectrometers

摘要

In this paper, a double-slit-grating (DSG) is presented for improving the spectral resolution of microspec-trometer. We try to develop a simple and low-cost fabrication method by synthetically using the interference lithography, ion etching technique and localized surface plasmon imaging lithography: A grating was first obtained with traditional interference lithography, and then it was copied by using transparent material polydimethylsiloxane (PDMS) to form a soft mask, which can contact the silver superlens firmly, and finally the DSG will be fabricated though localized surface plasmon imaging lithography. This double-slit-grating can enhance the spectral resolution of microspectrometers to 0.1 nm level. DSG made of metal has rich spectral characteristics and spectral sensibility, which makes it suitable for biomedical sensors.