Random 2-D layout decomposition and synthesis using self-aligned multiple patterning and stitching techniques

摘要

To break through 1-D layout limitations, we develop a computationally efficient random 2-D layout decomposition and synthesis technique which combines the optical and self-aligned multiple patterning processes. A polynomial time algorithm is developed to decompose the target layout into two components, each containing one or multiple sets of unidirectional patterns that can be formed by a self-aligned multiple patterning and cut processes. With no need of vias, the final random 2-D patterns are formed by directly stitching two components together. The advantages of this novel patterning approach include 2-D design freedom, multiple-pitch/CD capability, and significant reduction of cut/via steps. The developed decomposition and synthesis algorithms are tested using 2-D layouts from NCSU open cell library and the experimental results verify their functionality. (C) 2015 Elsevier B.V. All rights reserved.