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首页> 外文期刊>Microelectronic Engineering >Electrical characteristics of a novel interposer technique using ultra-low-resistivity silicon-pillars with polymer insulation as TSVs
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Electrical characteristics of a novel interposer technique using ultra-low-resistivity silicon-pillars with polymer insulation as TSVs

机译:使用具有聚合物绝缘的超低电阻硅柱作为TSV的新型中介层技术的电气特性

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摘要

In this paper, a novel silicon interposer technique using silicon pillars with ultra-low-resistivity as the conductor while polymer Benzocyclobutene (BCB) as liner layer is proposed. Fabrication flow of the proposed interposer structure is developed and implemented. Electrical performances, including transmission performance and signal distortion characteristics, are investigated and presented using 3D full wave simulator and SPICE type circuit simulator such as ANSYS's HFSS software and Agilent's ADS software, respectively. The impacts of geometric parameters and resistivity of silicon substrate on electrical characterizations are investigated in both frequency domain and time domain. Results show that the proposed interposer has comparable electrical performances such as return loss and insertion loss with conventional Cu-based through-silicon-via (TSV) structure in frequency region from 0.1 GHz to 10 GHz, despite of slight degradation at low frequency, but it involves a much simpler and more feasible process flow compared with the latter technique. (C) 2014 Elsevier B.V. All rights reserved.
机译:本文提出了一种新型的硅中介层技术,该技术采用具有超低电阻率的硅柱作为导体,而聚合物苯并环丁烯(BCB)作为衬里层。开发并实施了所提出的中介层结构的制造流程。分别使用3D全波模拟器和SPICE型电路模拟器(例如ANSYS的HFSS软件和安捷伦的ADS软件)来研究和介绍电气性能,包括传输性能和信号失真特性。在频域和时域中研究了硅衬底的几何参数和电阻率对电特性的影响。结果表明,尽管在低频范围内有轻微的衰减,但所提出的中介层在0.1 GHz至10 GHz的频率范围内具有与传统的基于铜的硅通孔(TSV)结构相当的电性能,例如回波损耗和插入损耗。与后一种技术相比,它涉及更简单,更可行的工艺流程。 (C)2014 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Microelectronic Engineering》 |2015年第4期|146-152|共7页
  • 作者单位

    Beijing Inst Technol, Sch Informat & Elect, Beijing 100081, Peoples R China;

    Beijing Inst Technol, Sch Informat & Elect, Beijing 100081, Peoples R China;

    Beijing Inst Technol, Sch Informat & Elect, Beijing 100081, Peoples R China;

    Beijing Inst Technol, Sch Informat & Elect, Beijing 100081, Peoples R China;

    Beijing Inst Technol, Sch Informat & Elect, Beijing 100081, Peoples R China;

    Beijing Inst Technol, Sch Informat & Elect, Beijing 100081, Peoples R China;

    Beijing Inst Technol, Sch Informat & Elect, Beijing 100081, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Interposer technique; Ultra-low-resistivity; Benzocyclobutene (BCB); Through-silicon-vias (TSVs);

    机译:中介层技术;超低电阻率;苯并环丁烯(BCB);硅通孔(TSV);

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