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Solution-processed conformal coating of ferroelectric polymer film and its application to multi-bit memory device

机译:铁电聚合物膜的固溶保形涂层及其在多位存储器件中的应用

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摘要

Ferroelectric multi-bit storage memory which is fabricated by means of the patterning and double-coating of ferroelectric polymer film is demonstrated. The multi-bit memory device demonstrated here has two thicknesses in a capacitor. Therefore, ferroelectric switching at each thickness arises in different voltage range. The structured capacitor with two different thicknesses is realized by optimizing two processes, i.e., the photo-lithographical patterning of the ferroelectric film and a double-coating method for the formation of the multilayer structure. Not only photo-lithographical patterning but also the double-coating method of ferroelectric film was performed with a solubility-controlled ferroelectric polymer solution created by the addition of an insoluble solvent. From electrostatic force microscopy and displacement-voltage measurements, the fabricated multi-bit storage memory operated as predicted for a multi-bit memory scheme. The solubility-controlling method suggested here will offer additional promising routes to fabricate complex organic devices based on a solution process. (C) 2016 Elsevier B.V. All rights reserved.
机译:对通过铁电聚合物膜的图案化和双重涂布而制造的铁电多位存储存储器进行说明。此处演示的多位存储设备在电容器中具有两个厚度。因此,在不同的电压范围内会出现每种厚度的铁电开关。通过优化两个过程,即铁电薄膜的光刻构图和用于形成多层结构的双重涂覆方法,可以实现具有两种不同厚度的结构化电容器。用添加不溶性溶剂产生的溶解度受控的铁电聚合物溶液不仅可以进行光刻构图,而且还可以进行铁电膜的双层涂覆方法。从静电力显微镜和位移电压测量,所制造的多位存储存储器按多位存储方案的预期运行。本文提出的溶解度控制方法将提供其他有前途的途径,以基于溶液法来制造复杂的有机器件。 (C)2016 Elsevier B.V.保留所有权利。

著录项

  • 来源
    《Microelectronic Engineering》 |2016年第7期|68-72|共5页
  • 作者单位

    Korea Adv Inst Sci & Technol, Dept Mech Engn, 373-1 Guseong Dong, Daejeon 305701, South Korea;

    Korea Adv Inst Sci & Technol, Dept Elect Engn, 373-1 Guseong Dong, Daejeon 305701, South Korea;

    Korea Adv Inst Sci & Technol, Dept Elect Engn, 373-1 Guseong Dong, Daejeon 305701, South Korea;

    Korea Adv Inst Sci & Technol, Dept Elect Engn, 373-1 Guseong Dong, Daejeon 305701, South Korea;

    Korea Adv Inst Sci & Technol, Dept Elect Engn, 373-1 Guseong Dong, Daejeon 305701, South Korea;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    VDF-TrFE; Solubility control; Patterning; Multilayer; Multi-bit memory;

    机译:VDF-TrFE;溶解度控制;图形;多层;多位存储器;

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