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Growth of ZnO nanowires on multi-layered polymer structures fabricated by UV liquid transfer imprint lithography

机译:紫外液体转移压印光刻技术在多层聚合物结构上生长ZnO纳米线

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Among various growth processes, hydrothermal synthesis has been widely employed to produce ZnO nanowires because of its simplicity and cost effectiveness. However, the successful hydrothermal synthesis of ZnO nano wires on multi-layered polymer structures has been limited due to growth inhibitors in the polymer. For example, alpha-hydroxy ketone resolved in a UV-curable polyurethane acrylate (PUA) resin forms carboxyl groups (COOH) consisting of hydroxyl groups (O-H) on the alpha-position of a carbonyl group (C=0) during the UV-curing process. The carboxyl groups suppress the nucleation and growth of ZnO nanowires. In this paper, multi-layered polymer structures were fabricated by liquid transfer imprint lithography (LTIL), and the enriched carboxyl groups on the UV-cured PUA structures were pre-treated with hexamethylenetetramine (HMTA) solution to reduce the inhibitive influence of the carboxyl groups. The HMTA pre-treatment enabled ZnO nanowires to grow hydrothermally on multi-layered PUA structures despite the initial presence of carboxyl groups. (C) 2017 Elsevier B.V. All rights reserved.
机译:在各种生长过程中,水热合成因其简单性和成本效益而被广泛用于生产ZnO纳米线。然而,由于聚合物中的生长抑制剂,在多层聚合物结构上成功地水热合成ZnO纳米线受到了限制。例如,在UV-固化过程中,在UV固化聚氨酯丙烯酸酯(PUA)树脂中分解出的α-羟基酮会在羰基(C = 0)的α-位上形成由羟基(OH)组成的羧基(COOH)。固化过程。羧基抑制ZnO纳米线的成核和生长。本文通过液体转移压印光刻技术(LTIL)制备了多层聚合物结构,并用六亚甲基四胺(HMTA)溶液预处理了UV固化的PUA结构上富集的羧基,以减少羧基的抑制作用。组。尽管最初存在羧基,但是HMTA预处理使ZnO纳米线能够在多层PUA结构上水热生长。 (C)2017 Elsevier B.V.保留所有权利。

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