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首页> 外文期刊>Microelectronic Engineering >Infrared detector based on crystal ion sliced LiNbO_3 single-crystal film with BCB bonding and thermal insulating layer
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Infrared detector based on crystal ion sliced LiNbO_3 single-crystal film with BCB bonding and thermal insulating layer

机译:基于晶体离子切片的具有BCB键和隔热层的LiNbO_3单晶膜的红外探测器

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摘要

In this study, LiNbO3 (LNO) thin films prepared by crystal ion slicing (CIS) technology have been used to fabricate pyroelectric infrared detectors. Crack free LNO film with single crystal structure have been prepared on a LNO holder substrate by CIS technology using He+ implantation and benzocyclobutene (BCB) bonding process. The surface roughness caused by the Gauss distribution of He+ has been decreased from 10.81 nm to 4.66 nm after Ar+ treatment. The pyroelectric coefficient of LNO thin film is 5 x 10(-5)C/m(2).K measured by dynamic method, which is comparable to LNO bulk crystal materials. The Rv value of infrared device fabricated by LNO single crystal film was calculated to be 1.93 x 10(3) V/W at 5 Hz chopper frequency. Compared to normally used SiO2 bonding layer, the thermal isolation properties have been improved by BCB bonding material according to the thermal finite element analysis. The results demonstrated CIS technology using BCB bonding materials is a promising method to fabricate integrated pyroelectric devices.
机译:在这项研究中,通过晶体离子切片(CIS)技术制备的LiNbO3(LNO)薄膜已用于制造热释电红外探测器。利用He +注入和苯并环丁烯(BCB)结合工艺,通过CIS技术在LNO支架衬底上制备了具有单晶结构的无裂纹LNO膜。 Ar +处理后,由He +的高斯分布引起的表面粗糙度已从10.81 nm降低到4.66 nm。 LNO薄膜的热电系数为5 x 10(-5)C / m(2).K,采用动态方法测得,与LNO块状晶体材料相当。由LNO单晶膜制造的红外器件的Rv值在斩波频率为5 Hz时计算为1.93 x 10(3)V / W。与常规的SiO2粘结层相比,根据热有限元分析,BCB粘结材料改善了热绝缘性能。结果表明,使用BCB键合材料的CIS技术是一种制造集成热释电器件的有前途的方法。

著录项

  • 来源
    《Microelectronic Engineering》 |2019年第5期|1-5|共5页
  • 作者单位

    Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Sichuan, Peoples R China|Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Sichuan, Peoples R China|Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Sichuan, Peoples R China|Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

    Univ Elect Sci & Technol China, Sch Elect Sci & Engn, Chengdu 610054, Sichuan, Peoples R China|Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Sichuan, Peoples R China;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Crystal ion slicing; Pyroelectric infrared detector; Thermal simulation; LiNbO3;

    机译:晶体离子切片;热释电红外探测器;热模拟;LiNbO3;

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