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A novel hot embossing Graphene transfer process for flexible electronics

机译:一种用于柔性电子产品的新颖的热压印石墨烯转移工艺

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摘要

In this work a new Single Layer Graphene (SLG) transfer technique exploiting a hot embossing process was carried out. Flexible electrolyte gated Graphene Field Effect Transistors (G-FET) were fabricated and tested electrically. A polymeric transparent foil suitable for optics and flexible electronics, Cyclic Olefin Copolymer (COC) was used as flexible substrate. Raman characterization confirmed that the new Hot Embossing Graphene Transfer (HEGT) is suitable for the deposition of SLG and the fabrication of G-FETs. A Comparison with SW common transfer method was carried out and proven for G-FETs fabrication. The HEGT devices showed typical characteristics and maintained the same performances when the substrate was bent. This demonstrated that the HEGT allows for efficient transfer of high quality SLG on large area thus providing the opportunity for the exploitation on a large scale production process for flexible substrates.
机译:在这项工作中,利用热压印工艺进行了新的单层石墨烯(SLG)转移技术。制作了柔性电解质门控石墨烯场效应晶体管(G-FET)并进行了电气测试。适用于光学器件和柔性电子产品的聚合物透明箔片,环状烯烃共聚物(COC)被用作柔性基板。拉曼表征证实新的热压印石墨烯转移(HEGT)适用于SLG的沉积和G-FET的制造。进行了与SW普通转移方法的比较,并证明了其可用于G-FET的制造。当衬底弯曲时,HEGT器件表现出典型的特性并保持相同的性能。这表明,HEGT可以在大面积上高效转移高质量的SLG,从而为大规模生产柔性基板提供了机会。

著录项

  • 来源
    《Microelectronic Engineering》 |2019年第3期|16-19|共4页
  • 作者单位

    Politecn Torino, DISAT, Chilab Mat & Microsyst Lab, Turin, Italy;

    Politecn Torino, DISAT, Chilab Mat & Microsyst Lab, Turin, Italy|Italian Inst Technol, Ctr Sustainable Picture Technol, Turin, Italy;

    Politecn Torino, DISAT, Chilab Mat & Microsyst Lab, Turin, Italy;

    Politecn Torino, DISAT, Chilab Mat & Microsyst Lab, Turin, Italy;

    Politecn Torino, DISAT, Chilab Mat & Microsyst Lab, Turin, Italy|CNR IMEM, Parco Area Sci 37a, I-43124 Parma, Italy;

    Politecn Torino, DISAT, Chilab Mat & Microsyst Lab, Turin, Italy|Italian Inst Technol, Ctr Sustainable Picture Technol, Turin, Italy;

    Politecn Torino, DISAT, Chilab Mat & Microsyst Lab, Turin, Italy|CNR IMEM, Parco Area Sci 37a, I-43124 Parma, Italy;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

    Graphene; CVD; Graphene transfer; Flexible electronics; Hot embossing; G-FET;

    机译:石墨烯;CVD;石墨烯转移;柔性电子;热压纹;G-FET;

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