Control System Speeds Start-up, Stabilizes Process Air in DUV Litho Tool Clusters

摘要

As chipmakers grapple with the stringent requirements of deep ultraviolet (DUV) photolithography, they confront a wide range of organic contaminants—from amines, halogens, and radicals to chlorine, bromide, and arsine. To remove such contaminants, most fabs have added chemical filters to their process air control systems. But as chipmakers have discovered, coupling chemical filters with conventional environmental control units (ECUs) can pose significant challenges.