Removing post-CMP residue through carbon dioxide snow cleaning

摘要

Cleaning processes for removing chemical-mechanical polishing (CMP) residues rely on double-sided brush scrubbers and the use of harsh chemistries (typically ammonium hydroxide and hydrogen peroxide). Unfortunately, post-CMP cleaning is expensive to carry out because it involves the frequent replacement of PVA or nylon brushes, the consumption of large quantities of DI water, and the disposal of chemical wastes.