首页> 外文期刊>Micro >Using real-time process control to enhance performance and improve yield learning
【24h】

Using real-time process control to enhance performance and improve yield learning

机译:使用实时过程控制来增强性能并改善收益学习

获取原文
获取原文并翻译 | 示例
       

摘要

Because a consistent process is much easier to tune than an inconsistent one, the stability of semiconductor manufacturing processes is critical to achieving high device yields. There are many ways to measure process performance. Unfortunately, since the one that really matters—yield—is often many days and wafers away from the actual process run, it is important to implement an intermediate measure to minimize the mean time to detect (MTTD) of any process variations. In-line methods such as photo-limited yield, scanning electron microscopy, and kerf electrical measurements can be useful, but they have an MTTD on the order of days or weeks. Although they may indicate that a problem exists, they do not provide sufficient insight into why. After a defect excursion is discovered through these methods, a process engineer must then examine the tool or maintenance logs or conduct experiments to determine its root cause.
机译:因为一致的过程比不一致的过程更容易调整,所以半导体制造过程的稳定性对于实现高器件良率至关重要。有许多方法可以衡量过程性能。不幸的是,由于真正重要的一项(良率)通常需要数天的时间,并且晶圆会偏离实际的工艺流程,因此实施中间措施以最小化任何工艺变化的平均检测时间(MTTD)至关重要。诸如光限产量,扫描电子显微镜和切口电学测量等在线方法可能是有用的,但它们的MTTD约为数天或数周。尽管它们可能表明存在问题,但它们并未提供足够的见解。通过这些方法发现缺陷偏移后,过程工程师必须随后检查工具或维护日志或进行实验以确定其根本原因。

著录项

  • 来源
    《Micro》 |2000年第2期|p.49-55|共7页
  • 作者

    Raymond J. Bunkofske;

  • 作者单位
  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 环境科学、安全科学;
  • 关键词

  • 入库时间 2022-08-18 00:11:08

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号