Preparing a gas delivery system for excimer lasers with fluorine passivation of 316L stainless steel

摘要

Aith the increasing demand in the semiconductor industry for critical line dimensions below 250 nm, mi-crolithography has taken on greater importance, representing almost one-third of an IC's total production cost. The mi-crolithography process, which producesrnhighly accurate microscopic, two-dimensional patterns in photosensitive resist material, relies on deep-ultraviolet (DUV) steppers and scanners to achieve linewidth reductions.