Microstructure and electrical properties of Pb(Zr_(0.52)Ti_(0.48))O_3 ferroelectric films on different bottom electrodes

摘要

The crystalline quality, dielectric and ferroelectricity of the Pb(Zr_(0.52)Ti_(0.48))O_3 (PZT) films deposited on the LaNiO_3 (LNO), LNO/Pt and Pt bottom electrodes were comparatively analyzed to investigate the possibility for their application. LNO thin firms were successfully prepared on Si (100) and Pt(111)/Ti/SiO_2/Si substrates by modified metallorganic decomposition (MOD). The PZT thin firms were spin-coated onto the LNO, LNO/Pt and Pt bottom electrodes by sol-gel method. The crystallographic orientation and the micro structure of the resulting LNO films and PZT thin films on the different bottom electrodes were characterized by X-ray diffraction analysis. The dielectric and ferroelectric properties of PZT films on the different bottom electrodes are discussed. The PZT firms deposited onto Pt/Ti/SiO_2/Si and LNO/Si substrates show strong (110) and (100) preferred orientation, respectively, while the films deposited onto LNO/Pt/Ti/SiO_2/Si substrates show the peaks of mixed orientations. PZT films on LNO and LNO/Pt bottom electrodes have larger dielectric constant and remnant polarizations compared with those grown on the Pt electrode.