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Electrodeposition and characterization of nanocrystalline cuprous oxide thin films on TiO_2 films

机译:TiO_2薄膜上纳米晶氧化亚铜薄膜的电沉积和表征

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摘要

The grain size in cuprous oxide (Cu_2O) thin films is a key to improve the performance of solar application devices. In this paper, electrochemical deposition of nanocrystalline Cu_2O thin films on TiO_2 films coated on transparent conducting optically (TCO) glass substrates by cathodic reduction of cupric acetate has been investigated. The deposition kinetics of nanocrystalline Cu_2O thin films were studied and the parameters limiting the deposition of the films were determined. Pure Cu_2O deposited at bath temperature between 0 and 30 deg C produced spherically shaped grains with 40-50 nm diameters which have not been reported previously. The effect of pH was studied and a solution with a pH between 5.5 and 6 was found to be best. The effect of annealing on bulk structure, electrical resistivity, and optical absorption of nanocrystalline Cu_2O thin films was also studied and the results were discussed.
机译:氧化亚铜(Cu_2O)薄膜中的晶粒尺寸是提高太阳能应用设备性能的关键。本文研究了通过乙酸铜的阴极还原,在透明导电光学(TCO)玻璃基板上涂覆的TiO_2薄膜上电化学沉积纳米晶态的Cu_2O薄膜。研究了纳米晶Cu_2O薄膜的沉积动力学,并确定了限制薄膜沉积的参数。在0到30摄氏度的浴温下沉积的纯Cu_2O产生了直径为40-50 nm的球形晶粒,这以前没有报道过。研究了pH的影响,发现pH在5.5和6之间的溶液是最好的。还研究了退火对纳米晶Cu_2O薄膜的体结构,电阻率和光吸收的影响,并讨论了结果。

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