Fabrication of photosensitive self-assembled multilayer films based on porphyrin and diazoresin via H-bonding

摘要

Photosensitive multilayer films have been fabricated from tetra(4-carboxylphenyl)porphyrin (TCPP) and diazoresins (DAR) via H-bonding self-assembly technique. Under irradiation with UV light, following the decomposition of the diazonium group, the H-bonding in the films converts to a covalent bond. These changes had been further confirmed by UV-Vis spectra and FTIR spectra. As a consequence, the stability of the films towards polar solvents increases dramatically. From the surface photovoltage spectra (SPS), it could be followed that the photovoltage response of the n-type silicon increased remarkably when modified with 10 bilayers of TCPP/DAR multilayer films.