Formation of Ti_2AlN nanolaminate films by multilayer-deposition and subsequent rapid thermal annealing

摘要

Multilayers consisting of titanium layers with a thickness of 4.5 nm and aluminum nitride layers with a thickness of 3 nm were deposited onto Si/Si_3N_4 substrates. Subsequently, the multilayer systems were annealed by a rapid thermal annealing process. This way, thin films of almost pure M_(n+1) AX_n-phase Ti_2AlN could be produced, as confirmed by X-ray diffraction, glow discharge optical emission spectroscopy and high-resolution transmission electron microscopy. This procedure has a high potential for the preparation of MAX phase coatings.